Wettability and cleaning of silicon wafers in tetramethyl ammonium hydroxide-based solutions

J. S. Jeon, Srini Raghavan

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Scopus citations

Abstract

The effectiveness of commercially available tetramethyl ammonium hydroxide (TMAH)-based solutions (PFC-1 and ANC-1) in modulating the wettability of silicon was investigated. The results showed that hydrophobic silicon wafers can be made wettable by immersion/emersion cycling in TMAH solutions or through the addition of hydrogen peroxide or surfactant to the solutions. The etch rate of silicon wafer in the various TMAH-containing solutions was also investigated. Particle removal, investigated as a function of solution pH and initial particle count on wafers, showed that there is an optimum particle count on the wafers above which particle removal with PFC-1 solution is feasible.

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ASJC Scopus subject areas

  • Environmental Engineering

Cite this

Jeon, J. S., & Raghavan, S. (1993). Wettability and cleaning of silicon wafers in tetramethyl ammonium hydroxide-based solutions. In Anon (Ed.), Proceedings, Annual Technical Meeting - Institute of Environmental Sciences (Vol. 1, pp. 268-273). Publ by Inst of Environmental Sciences.