Wettability modification of polysilicon for stiction reduction in silicon based micro-electromechanical structures

Angeles Marcia Almanza-Workman, Srini Raghavan, Pierre Deymier, David J. Monk, Ray Roop

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Scopus citations
Original languageEnglish (US)
Title of host publicationUltra Clean Processing of Silicon Surfaces 2000
EditorsMarc Heyns, Paul Mertens, Marc Meuris
PublisherTrans Tech Publications Ltd
Pages23-26
Number of pages4
ISBN (Print)9783908450573
DOIs
StatePublished - Jan 1 2001
Event5th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2000 - Ostend, Belgium
Duration: Sep 18 2000Sep 20 2000

Publication series

NameSolid State Phenomena
Volume76-77
ISSN (Print)1012-0394
ISSN (Electronic)1662-9779

Other

Other5th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2000
CountryBelgium
CityOstend
Period9/18/009/20/00

Keywords

  • Polysilicon
  • Self-Assembled monolayers
  • Stiction
  • Water dispersible silanes

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Materials Science(all)
  • Condensed Matter Physics

Cite this

Almanza-Workman, A. M., Raghavan, S., Deymier, P., Monk, D. J., & Roop, R. (2001). Wettability modification of polysilicon for stiction reduction in silicon based micro-electromechanical structures. In M. Heyns, P. Mertens, & M. Meuris (Eds.), Ultra Clean Processing of Silicon Surfaces 2000 (pp. 23-26). (Solid State Phenomena; Vol. 76-77). Trans Tech Publications Ltd. https://doi.org/10.4028/www.scientific.net/SSP.76-77.23