X-ray diffraction determination of stress in magnetron-sputtered permalloy films

C. D. England, C. M. Falco, J. A. Aboaf

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The stresses in magnetron-sputtered films depend on the deposition parameters. Magnetron-sputtered Permalloy (Ni 81%, Fe 19%) films were deposited onto fused quartz substrates using varying deposition parameters, including argon pressure, substrate bias, deposition rate, and film thickness. A Bragg-Brentano diffractometer was used to find the average stress in the films. A Seemann-Bohlin diffractometer was used to measure the strain either parallel or perpendicular to the magnetic easy axis in the Permalloy film. Kroner x-ray elastic constants were used to calculate the stresses from the strains determined by x-ray diffraction techniques. The average stress in the magnetron-sputtered Permalloy films was highly tensile but could be reduced by the appropriate combination of deposition parameters. The strain difference could also be modified by changing the deposition parameters.

Original languageEnglish (US)
Pages (from-to)3227-3229
Number of pages3
JournalJournal of Applied Physics
Issue number8
StatePublished - Dec 1 1988


ASJC Scopus subject areas

  • Physics and Astronomy(all)

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